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February 2009 |
Insights & Innovations from CyberOptics Semiconductor |
Breaking Metrology News... >> NEW! CyberOptics introduces WaferSense® APS Airborne Particle Sensor. >> WaferSense® AVS300CL selected as a finalist for the S/B EDN innovation award in the category "Design for Test, Production Test & Metrology." VOTE for us here! >> Level equipment with enhanced vertical accuracy, increased range of NEW ALS2V. Software Updates and Latest Downloads... >> Fabs evaluate equipment acceleration and vibration with new AVS VibeReview™ software Did You Know? >> Fab evaluations of wireless WaferSense® devices indicate ROI is often achieved after a single use? Inside CyberOptics Semiconductor >> Veteran of Asia's Semiconductor Industry, Ferris Chen, joins Asian Operations. News for the Road >> Here's where we'll be next... March 17-20, 2009 CyberOptics |
Trends in Wafer Processing Technology Reports from the fab Increasing Uptime of Endura/Centura Tool Sets and Film-Deposition Uniformity. The User: A thin-film group at a 300mm European fab. Legacy Robot Teaching Hits Snag The thin-film group at a European fab needed to reduce the tool and production downtime borne from a time-consuming metrology process that required multiple technicians to vent and dismantle Endura/Centura tool sets and employ manual methods to teach wafer-transfer coordinates to robots. The process took approximately 24 hours. The legacy robot-teaching method required techs to follow a manual process to set up, maintain and troubleshoot the Endura and Centura tools. The labor-intensive process produced inaccurate measurements in micrometers, misalignments and wafer mishandling in the tools. The process ultimately reduced the group’s film-deposition uniformity and die yield per wafer due to particle generation, producing wafer scrap, according to Allyn Jackson, customer support manager at CyberOptics Semiconductor. “The manual teaching process was basically inefficient and had become a significant drag on the productivity of staff, tools and the entire group,” Jackson said. “They were looking to address and correct what was, for them, clearly a flawed process.” Technically Speaking Real-Time Vibration Monitoring Optimizes 200mm Equipment Productivity by Dennis J. Bonciolini, CTO, CyberOptics Semiconductor; article originally appeared in Fab Engineering & Operations Increased equipment productivity is key for 200mm fabs to realize profitability goals. This is true especially because some products won't be transitioned to 300mm production; therefore, equipment at these 200mm fabs will need to keep running at optimum levels to reduce wafer scrap and achieve maximum yields. It is becoming increasingly imperative that process and equipment engineers be armed with a new set of solutions for monitoring equipment vibration and acceleration that provides a better feedback loop for controlling equipment conditions in order to accelerate yield improvements and to reduce machine downtime. As the semiconductor industry gears up
to support the exploding demands in automotive,
consumer and cell phone applications,
it is becoming increasingly imperative
that tool and process reproducibility be controlled
to tolerances never previously
required in order to achieve greater yields. Viewpoint Industry Leaders Share Their Views on SemiconductorPackagingNews.com Dennis Bonciolini, CTO/Director of Engineering and Marketing, CyberOptics Semiconductor At CyberOptics Semiconductor, 2008 was the best year on record for our newest product line of wireless wafer-like sensors, WaferSense®. We saw double-digit growth, year over year, for that line in 2008 and we are hoping that momentum will continue into 2009. >> see more |